DNAPL Remediation: Trap & Treat® Strategies That Close the Gap

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What Is DNAPL?

Chlorinated DNAPL behaves differently from petroleum LNAPL. It pools in fractures and low‑permeability zones while driving deeper into the geology when physical opportunities arise. It also diffuses from these matrices, keeping groundwater above standards for years to decades. RPI®‘s Trap & Treat® platform is built for this reality. We pair fast, in situ adsorption with powerful reductive chemistry to accelerate DNAPL remediation while controlling mass diffusion. That’s a DNAPL remediation strategy that protects the public and meets remediation goals. 

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How Does BOS 100® Work?

BOS 100® is an activated carbon, iron technology designed for DNAPL source areas and dissolved phase plumes common to chlorinated solvents. Structurally integrated metallic iron within the activated carbon structure ensures that abiotic dechlorination occurs in the carbon where the chlorinated solvent is adsorbed. The end products of degradation, such as dissolved iron, chloride, and unregulated gases such as ethylene and methane, support clean closure without harmful degradation products. 

This is how Trap & Treat® works underground:

  • At‑capture containment and flux control: The activated carbon surface adsorbs chlorinated ethenes, controlling exposure while mass electron transfer reduces the chlorinated solvents.
  • Point‑of‑capture abiotic destructionStructurally integrated metallic iron drives reductive dechlorination on the internal surface of the activated carbon, producing chloride, unregulated gases, and ethene and ethane. As mass is degraded, adsorption sites are made available to adsorb additional compounds, sustaining DNAPL remediation.

Bedrock DNAPL Remediation

Where Our Approach Excels 

Use the scenarios below to align product and placement with your conceptual site model:

  • DNAPL source areas with persistent rebound: Establish a reactive, adsorptive treatment zone to control exposure and drive on‑contact dechlorination.
  • Bedrock DNAPL remediation with refusal and depth constraints: Employ pre‑drill/DPT or angled injection to place BOS 100® along fracture pathways.
  • Sites needing measurable progress under DNAPL remediation regulations: Combine RDC, surgical placement, and clear lines of evidence to document mass reduction and risk control. 

Bedrock-Ready Design and Installation

High‑resolution RDC pinpoints DNAPL mass, fracture pathways, and back‑diffusion. RPI‑Group Approved Installers then place BOS 100® by in situ injections, so the media reaches the controlling fractures. The RPI® Support Lab provides no‑charge GC/MS during deployment to verify distribution and early performance.

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Remediation Resource Highlight

Why RPI® for DNAPL Remediation? 

When DNAPL cleanup has to work in rock and tight formations, RPI®‘s Trap & Treat® media are built for the job. BOS 100® embeds reactive iron within activated carbon, bringing capture and on‑contact dechlorination to the same surface — without relying on narrow geochemical windows. 

For co‑mingled or stubborn constituents, CAT 100® adds enhanced electron transfer to “catalyze” the reaction, increasing longevity and carry degradation through to meet remediation goals. Paired with surgical placement methods in fractured and low‑permeability settings, this is DNAPL source zone remediation engineered to produce results.

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